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Systems and methods for stochastic models of mask process variability
Systems and methods for stochastic models of mask process variability
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机译:掩模工艺可变性随机模型的系统和方法
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摘要
Systems and methods are disclosed for a stochastic model of mask process variability of a photolithography process, such as for semiconductor manufacturing. In one embodiment, a stochastic error model may be based on a probability distribution of mask process error. The stochastic error model may generate a plurality of mask layouts having stochastic errors, such as random and non-uniform variations of contacts. In other embodiments, the stochastic model may be applied to critical dimension uniformity (CDU) optimization or design rule (DR) sophistication.
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