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Method and system for a process sensor to compensate SoC parameters in the presence of IC process manufacturing variations

机译:在集成电路制造工艺变化的情况下,用于过程传感器补偿SoC参数的方法和系统

摘要

Certain aspects of a method and system for a process sensor to compensate SoC parameters in the presence of IC process manufacturing variations are disclosed. Aspects of one method may include determining an amount of process variation associated with at least one transistor within a single integrated circuit. The determined amount of process variation may be compensated by utilizing a process dependent current, a bandgap current, and a current associated with a present temperature of the transistor. The process dependent current, the bandgap current and the current associated with the present temperature of the transistor may be combined to generate an output current. A voltage generated across a variable resistor may be determined based on the generated output current.
机译:公开了在IC工艺制造变化的情况下用于过程传感器补偿SoC参数的方法和系统的某些方面。一种方法的方面可以包括确定与单个集成电路内的至少一个晶体管相关联的工艺变化量。可以通过利用取决于工艺的电流,带隙电流以及与晶体管的当前温度相关联的电流来补偿所确定的工艺变化量。取决于工艺的电流,带隙电流和与晶体管的当前温度相关的电流可以被组合以产生输出电流。可以基于所产生的输出电流来确定跨可变电阻器所产生的电压。

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