首页> 外国专利> SELECTIVE REMOVAL OF THIN FILMS BY MEANS OF PULSED LASER RADIATION IN ORDER TO STRUCTURE THE THIN FILMS

SELECTIVE REMOVAL OF THIN FILMS BY MEANS OF PULSED LASER RADIATION IN ORDER TO STRUCTURE THE THIN FILMS

机译:通过脉冲激光辐射选择性去除薄膜以构造薄膜

摘要

The selective removal of thin films relates to a method for structuring chalcopyrite-based thin film solar cells by means of pulsed laser radiation by removing previously applied films. The invention relates to a structuring method that results in only low thermal loads on the film system to be structured due to laser irradiation. According to the invention, the structuring of the thin films is achieved in that a laser beam characterized by wavelength, pulse duration, and energy density distribution is directed at the side of the substrate opposite the thin film system and thus the removal of films of the thin film system is achieved. A preferred field of application is the structuring of thin film solar cells on a flexible substrate.
机译:选择性去除薄膜涉及一种通过脉冲激光辐射通过去除先前施加的薄膜来构造基于黄铜矿的薄膜太阳能电池的方法。本发明涉及一种结构化方法,其由于激光辐照而仅在待构造的膜系统上产生低的热负荷。根据本发明,通过将以波长,脉冲持续时间和能量密度分布为特征的激光束指向与薄膜系统相对的衬底侧,从而去除薄膜的结构,来实现薄膜的结构化。薄膜系统得以实现。一个优选的应用领域是在柔性基板上构造薄膜太阳能电池。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号