PROJECTION SYSTEM WITH STATIC PATTERN GENERATION ELEMENTS AND A PLURALITY OF OPTICAL CHANNELS FOR OPTICAL 3-D MEASUREMENT

摘要

A projection system (20) for projecting at least one pattern onto at least one object (1) in a measurement object region comprises a first light source (22-1; 922), a second light source (22-2), a first projector group (25-1; 725; 825-1; 925-1) and a second projector group (25-2; 825-2; 925-2). Both the first projector group and the second projector group comprise a plurality of projector units (30-1 to 30-8) arranged in a two-dimensional manner. Each projector unit comprises a static pattern generation element (32-1 to 32-9; 832-1 to 832-9, 832-11 to 832-19), a field lens (33-1 to 33-9) in front of the static pattern generation element in an x-raying direction and a projection lens (35-1 to 35-9) behind the static pattern generation element in the x-raying direction. Each projector unit is configured to act on light emitted by the first or second light source and to project a respective partial pattern. The first projector group (825-1) is assigned to the first light source (22-1) and the second projector group (825-2) is assigned to the second light source (22-2). The first and second projector groups are configured to generate a first and a second plurality of partial patterns, respectively, which produce a first and a second resultant pattern, and therefore to generate the first and second resultant patterns inside the measurement object region using a structuring unit alone. The first light source and the second light source can be controlled independently of one another, with the result that the first resultant pattern and the second resultant pattern can be projected at different times or with different brightnesses.