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EXPOSURE DATA PROCESSING METHOD, A RECORDING MEDIUM WHICH PROCESSES EXPOSURE DATA, AND A RECORDING MEDIA IN WHICH A PROGRAM WHICH IMPLEMENTS THE SAME IS RECORDED

机译:曝光数据处理方法,一种处理曝光数据的介质以及一种记录有相同实现的程序中的记录介质

摘要

PURPOSE: An exposure data processing method, a recording medium which processes exposure data, and a recording media in which a program which implements the same is recorded are provided to prevent missing hole phenomenon of solder bumps.;CONSTITUTION: An exposure data processing method comprises the following steps: obtaining measured value toward the size of the same pattern from pattern of photosensitive layer(s110); and compensating the design data by using the measured value(s120). The measured value obtaining step comprises the following steps: obtaining image data corresponding to the same pattern; and producing the size of the same pattern from the image data.;COPYRIGHT KIPO 2013;[Reference numerals] (S110) Obtaining measured value toward the size of a pattern from a pattern on a photosensitive layer formed by exposure according to design data; (S112) Obtaining image data corresponding to the pattern from a scanning device which scans the surface of the photosensitive layer; (S114) Calculating the size of the pattern from the image data; (S120) Compensating the design data using a measured value; (S122) Calculating the difference of a design value and the measured value toward the size of the pattern; (S124) Compensating the design data as much as the difference of the design value and the measured value
机译:目的:提供一种曝光数据处理方法,一种处理曝光数据的记录介质以及一种记录有实现该程序的程序的记录介质,以防止焊料凸点的漏孔现象。进行以下步骤:从感光层的图案获得朝向相同图案的尺寸的测量值(s110);通过使用测量值来补偿设计数据(S120)。测量值获取步骤包括以下步骤:获取与相同图案对应的图像数据; COPYRIGHT KIPO 2013; [S110]从根据设计数据通过曝光形成的感光层上的图案获得朝向图案的尺寸的测量值;以及从图像数据产生相同图案的尺寸。 (S112)从对感光层的表面进行扫描的扫描装置获得与图案对应的图像数据; (S114)从图像数据计算图案的大小; (S120)使用测量值补偿设计数据; (S122)计算设计值和测量值相对于图案尺寸的差; (S124)补偿设计数据与设计值和测量值之差的程度

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