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EXPOSURE DATA PROCESSING METHOD, A RECORDING MEDIUM WHICH PROCESSES EXPOSURE DATA, AND A RECORDING MEDIA IN WHICH A PROGRAM WHICH IMPLEMENTS THE SAME IS RECORDED
EXPOSURE DATA PROCESSING METHOD, A RECORDING MEDIUM WHICH PROCESSES EXPOSURE DATA, AND A RECORDING MEDIA IN WHICH A PROGRAM WHICH IMPLEMENTS THE SAME IS RECORDED
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机译:曝光数据处理方法,一种处理曝光数据的介质以及一种记录有相同实现的程序中的记录介质
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摘要
PURPOSE: An exposure data processing method, a recording medium which processes exposure data, and a recording media in which a program which implements the same is recorded are provided to prevent missing hole phenomenon of solder bumps.;CONSTITUTION: An exposure data processing method comprises the following steps: obtaining measured value toward the size of the same pattern from pattern of photosensitive layer(s110); and compensating the design data by using the measured value(s120). The measured value obtaining step comprises the following steps: obtaining image data corresponding to the same pattern; and producing the size of the same pattern from the image data.;COPYRIGHT KIPO 2013;[Reference numerals] (S110) Obtaining measured value toward the size of a pattern from a pattern on a photosensitive layer formed by exposure according to design data; (S112) Obtaining image data corresponding to the pattern from a scanning device which scans the surface of the photosensitive layer; (S114) Calculating the size of the pattern from the image data; (S120) Compensating the design data using a measured value; (S122) Calculating the difference of a design value and the measured value toward the size of the pattern; (S124) Compensating the design data as much as the difference of the design value and the measured value
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