SUBSTRATE PROCESSING APPARATUS CAPABLE OF FORMING THE FLOW OF A STANDBY MODE TO BE IDENTICAL TO THE FLOW OF A PURGE MODE

摘要

PURPOSE: A substrate processing apparatus is provided to prevent contamination due to particles or organic materials and to equalize a flow in a standby chamber.;CONSTITUTION: A cleaning unit(41) supplies a nitrogen gas and clean air(40) to a standby chamber(12). An inhalation duct with an inhalation hole(32) is opposite to the cleaning unit. The inhalation duct inhales the clean air from the cleaning unit to the standby chamber. A collection duct(34) is connected to the inhalation duct through a connection duct(35,36). The inhaled air by the inhalation duct is collected in the collection duct and is discharged to an exhaust duct(61,62,63).;COPYRIGHT KIPO 2013