CAPACITY COMBINATION PLASMA CHAMBER INCLUDING AN INVERTING OR NON-INVERTING POWER SUPPLY STRUCTURE CAPABLE OF SUPPLYING PLASMA GENERATING POWER OF A FIRST FREQUENCY TO A LOWER ELECTRODE AND AN UPPER ELECTRODE

摘要

PURPOSE: A capacity combination plasma chamber including an inverting or non-inverting power supply structure is provided to improve capacity combination plasma generation efficiency by generating a power difference.;CONSTITUTION: A capacity combination plasma chamber comprises a plasma chamber (10), a main power supply source (20), and a phase control output unit (30). The plasma chamber includes an upper electrode and a lower electrode. A main power source supplies the plasma generation power of a first frequency to the upper electrode and the lower electrode. The phase control output unit supplies the frequency phase of the plasma generation power supplied to the power supply source.;COPYRIGHT KIPO 2013;[Reference numerals] (22) Impedance matcher; (40) ESC power; (50) Gas supply source; (60) Exhaust pump