Prognostic System Of Process Parameter Predicting Shape Of Semiconductor Structure, Semiconductor Fabication Equipment Having The Prognostic System Of Process Parameter And Method Of Using The Semiconductor Fabication Equipment Having The Same

摘要

Prediction of system process parameter meta to the expected shape of the semiconductor structure, there is provided a semiconductor manufacturing equipment, and use of that equipment having a prediction system in the process para meta. The forecasting system, the semiconductor manufacturing equipment and the use of equipment that is using a plasma emanating from the process chamber during the semiconductor manufacturing process can be carried out to present ways to mean the shape of the semiconductor structure in real time. For this, the prediction system may have a step change point corresponding prediction means and the process means. The process prediction means in combination, and the operation of the meta-para-sensor within the plasma processing chamber corresponding to the observed meta-para and wherein the semiconductor structure of a semiconductor structure can be secured para meta prediction. And, the step change point corresponding means can determine the transfer point within the process chamber process compared with each other sensors para meta. ; Semiconductor manufacturing equipment, the process chamber, the semiconductor structure and a plasma