Arrangement structure for extreme UV (EUV) projection exposure system, has gas flow supply unit that is provided to supply flow of gas through optic element, such that heat exchange takes place between optic element and flow of gas

摘要

The arrangement structure has an optic element (101,101') in which EUV light (103) is partially applied during operation. A gas flow supply unit is provided to supply the flow of gas through the optic element, such that the heat exchange takes place between the optic element and flow of gas. A flow channel (113) is formed such that the flow of gas is guided. The optic element is provided to form a portion of a boundary wall of the flow channel. Independent claims are included for the following: (1) a EUV projection exposure system; and (2) a method for operating EUV projection exposure system.