APPARATUS FOR FOREIGN SUBSTANCE DUST EMISSION, AND DUST EMISSION FACTOR ANALYSIS APPARATUS

摘要

PROBLEM TO BE SOLVED: To solve the problem that, though it is necessary for identifying a mechanism part which emits dust to dispose a wafer neat an operation mechanism part, operate the mechanism part and deposit a foreign substance on a surface of the wafer, in a current method implemented by a service engineer, the mechanism part is manually operated after the wafer is manually disposed at a specific position within an apparatus, and since the current method depends on manual work, efficiency for determining the factor of dust emission is low.SOLUTION: A device is provided for intensively promoting dust emission and depositing a foreign substance on a wafer by repeating operations of specific portions in an apparatus. For example, the apparatus comprises a control device, a specimen chamber for processing a specimen and a mechanism for carrying the specimen into and out of the specimen chamber. The mechanism includes a plurality of portions, the control device includes a script and the control device executes the script, thereby iteratively operating a specific portion in the plurality of portions of the mechanism.