ORGANIC SEMICONDUCTOR THIN FILM MANUFACTURING METHOD, ORGANIC SEMICONDUCTOR DEVICE MANUFACTURING METHOD APPLYING THE SAME THERETO AND ORGANIC SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To enable more reliable formation of a single crystalline region and enable achievement of high carrier mobility.;SOLUTION: In an organic semiconductor thin film manufacturing method, an ink-repellent region 12a and an ink-attracting region 12b are provided on a surface of a substrate 12 where an ink 11 is coated and the ink-attracting region 12b is formed to have a first width a which is a width at a place to start coating and a second width b obtained by reducing the first width a. With this configuration, crystals of an organic semiconductor material which exist in a polycrystalline state at a position of the first width a can be single-crystallized at a position of the second width b. For this reason, from the position of the second width b, crystals of the organic semiconductor material can grow in single crystal form, and when the second width b is increased to a third width c, crystals can be grown by utilizing each single crystal as a starting point (nucleus). Accordingly, since the same crystal can be grown, a good crystal having a high degree of orientation can be grown thereby to enable achievement of high carrier mobility.;COPYRIGHT: (C)2014,JPO&INPIT