SUBSTRATE FOR FINE UNEVEN SURFACE STRUCTURE FORMATION HAVING SINGLE PARTICLE FILM ETCHING MASK AND FINE UNEVEN SURFACE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a substrate for fine uneven surface structure formation having an etching mask consisted of a single particle film in which single particles are two-dimensionally arranged in a closest packing manner with high accuracy, a fine uneven surface structure which is obtained by etching the substrate, and a photovoltaic power generation panel having a sub wavelength antireflection fine structure surface with high efficiency and high accuracy consisted of the fine uneven surface structure.SOLUTION: There are provided: a substrate for fine uneven surface structure formation having an etching mask obtained by fixing a single particle film which is formed by two-dimensionally arranging single particles on a substrate surface in a closest packing manner on the substrate surface with fixing means; a fine uneven surface structure obtained by etching the substrate; and a photovoltaic power generation panel having a sub wavelength antireflection fine structure surface with high efficiency and high accuracy consisted of the fine uneven surface structure.