PATTERN FORMATION METHOD, THIN STYRENIC POLYMER FILM-FITTED SUBSTRATE, SURFACE WATER-REPELLENT MATERIAL, PASSWORD GENERATOR, INCUBATOR, PATTERN FORMATION AGENT, AND REVERSE PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern formation method, a pattern formation agent, and a reverse pattern formation method each capable of forming a pattern atop a substrate easily, stably, and inexpensively and to provide a thin styrenic polymer film-fitted substrate patterned by the pattern formation method, a surface water-repellent material, a password generator, and an incubator each equipped with the thin styrenic polymer film-fitted substrate.SOLUTION: The pattern formation method comprises an adhesion step of adhering, atop a substrate under a humidity condition of 10%-80%, a pattern formation solution including a styrenic polymer; at least one additive selected from the group consisting of acetic acid, methyl acetate, and acetylacetone; and a solvent; and a solvent removal step of removing, under a humidity condition of 10%-80%, the solvent from the substrate to which the pattern formation solution has been adhered.