Method for forming high-temperature oxidation ceramic film and substrate with high-temperature oxidation ceramic film

摘要

PPROBLEM TO BE SOLVED: To provide a method for forming a ceramic film capable of imparting satisfactory high temperature oxidation resistance to a base material. PSOLUTION: The method for forming the ceramic film is characterized in that the ceramic film having 99 mass% ceramic content is formed by using a spray powder made of ceramic particles having 99 mass% ceramic content to film-form the spray powder by a cold spray method. PCOPYRIGHT: (C)2010,JPO&INPIT