首页>
外国专利>
Multiple measurement techniques including focused beam scatterometry for characterization of samples
Multiple measurement techniques including focused beam scatterometry for characterization of samples
展开▼
机译:多种测量技术,包括聚焦光束散射法,用于表征样品
展开▼
页面导航
摘要
著录项
相似文献
摘要
A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
展开▼