Position control apparatus including iterative learning circuit, exposure apparatus, method for manufacturing device, and iterative learning method for use in position control apparatus having iterative learning circuit including learning filter

摘要

A position control apparatus includes a detecting unit configured to detect a position of a control target, a subtracting unit configured to subtract an output of the detecting unit from a target value, an iterative learning control circuit including a filter into which a deviation between the output of the detecting unit and the target value is input, where the iterative learning control circuit feeds forward a control input to the control target, and a parameter computing unit configured to compute a variation in a parameter of the control target. A characteristic of the filter is changed in accordance with the variation in the parameter of the control target.