TEMPLATE, SURFACE PROCESSING METHOD OF TEMPLATE, SURFACE PROCESSING APPARATUS OF TEMPLATE, AND PATTERN FORMATION METHOD

摘要

The template contains the entire surface with a roughness pattern. The template is configured to form a shape reflecting the uneven pattern on the surface of the resin . The resin is charged with a solution of the state before the photo-curable resin to cure the photo-curable resin liquid in the recess of the concave-convex pattern using light , and is formed by using a light curing the photo-curable resin liquid . The template comprises a surface layer and a substrate (base member). Substrate comprises a main surface having irregularities . The surface layer is used to form an uneven pattern for covering the unevenness of the substrate and reflects the shape of the irregularities . The contact angle between the liquid and the surface layer of the photo-curable resin before curing the photo-curable resin liquid state using light is also less than 30.