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PREPARATION METHOD OF ANATASE TITANIUM DIOXIDE NANOSHEET VIA CHEMICAL VAPOR DEPOSITION
PREPARATION METHOD OF ANATASE TITANIUM DIOXIDE NANOSHEET VIA CHEMICAL VAPOR DEPOSITION
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机译:化学气相沉积制备锐钛型二氧化钛纳米片的方法
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摘要
Provided in the present invention is a method for manufacturing an anatase titanium dioxide nanoplate having a high energy side exposed through a chemistry vapor deposition method using the spontaneous ignition of two gases having different temperatures. According to the present invention, the mixing gas of hydrogen and titanium tetrachloride is put in the fire at a temperature of the anatase-rutile phase transformation or less and deposited by the chemical vapor method, and a high density anatase titanium dioxide nanoplate with an excellent optical catalyst performance is synthesized by controlling the growth direction of the nanoplate using the silicone to expose the surface having a high surface energy.
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