Projection exposure system with at least one means for the reduction of the influence of pressure fluctuations

摘要

The invention relates to a projection exposure apparatus (10) for the semiconductor lithography, with an illuminating system (1) for illuminating a on a movable mask table (2), a mask (3) and a projection lens system (4) for mapping of the mask (3), on a semiconductor substrate (9), wherein at least one means (11, 14, 44, 20, 17, 42, 15, 19) is provided, at least parts of the lighting system (1) and / or of the projection objective (4) of the influence of pressure fluctuations in which the projection lens (4) or the illuminating system (1) surrounding medium, which are responsive to movement of the mask table (2) in the operation of the plant (10), at least partly to decouple.