Photoacid generator, photoresist comprising the photoacid generator, and coated article comprising the same

摘要

A compound having the formula (I): wherein each R 1 is independently H or a substituted or unsubstituted C 1-30 aliphatic group optionally linked to an adjacent R 1, each R 2 and R 3 is independently H, F, C 1-10 -Alkyl, C1-10-fluoroalkyl, C3-10-cycloalkyl or C3-10-fluorocycloalkyl, wherein at least one of R2 and / or R3 contains F, L1, L2 and L3 each independently a single bond or a C1-20 linking group optionally comprising a lactone group, wherein one or more of L1, L2 and L3 optionally form or form a ring structure, and wherein one or more of L1, L2 and L3 is optionally substituted with a polymerizable alpha-beta-unsaturated organic C2-20- X is an ether, ester, carbonate, amine, amide, urea, sulfate, sulfonate or sulfonamide-containing group, Z + is an organic or inorganic cation, and each is a independently an integer of 0 b is 12, b is an integer from 0 to 5, each c, d and r are independently 0 or 1 and p is an integer from 0 to 10 and q is an integer from 1 to 10. A photoresist comprises the photoacid generator and a coated article comprises the photoresist. The photoresist can be used to form a device.