Sputter coating device, useful in vacuum coating plant, comprises support unit having flange and carrier profile, and sputtering magnetron arranged parallel to profile, where magnetron is fixed at adjustable distance relative to profile

摘要

The device comprises a support unit (1) having a mounting flange (11) and a carrier profile (12), which has a free end connected to a terminal end of the mounting flange, a sputtering magnetron (2) arranged parallel to the carrier profile attached to the support unit, where the sputtering magnetron is fixed at an adjustable distance relative to the carrier profile. The sputtering magnetron comprises a firmly attached terminal box (3), which is distance-adjustable with the sputtering magnetron relative to the carrier profile. The device comprises a support unit (1) having a mounting flange (11) and a carrier profile (12), which has a free end connected to a terminal end of the mounting flange, a sputtering magnetron (2) arranged parallel to the carrier profile attached to the support unit, where the sputtering magnetron is fixed at an adjustable distance relative to the carrier profile. The sputtering magnetron comprises a firmly attached terminal box (3), which is distance-adjustable with the sputtering magnetron relative to the carrier profile. A flexible supply line is arranged between the mounting flange and the sputtering magnetron. The sputtering magnetron is adjustable through a gap adjustment device that is provided with a spindle and an actuator. An independent claim is included for a vacuum coating plant.