Method for operating device comprising elementary particle source and target element, involves using elementary particle source for changing temperature of area in tempering state

摘要

The method involves supplying a beam of elementary particles on a surface (22) of a target element (20) in a focal point or along a focal track. The temperature of an area of the surface is changed in a tempering state of the device. The area of the surface comprises the focal point or the focal track. The tempering state of the device is different from the main operating state. The elementary particle source is used for changing the temperature of the area in the tempering state. The elementary particle source is used for providing the elementary particles in main operating state. The time period, during which the beam impinges continuously on a point of the area of the surface, is changed relative to the main operating area.