首页> 外国专利> ABERRATION CORRECTION METHOD, MICROSCOPE OBSERVATION METHOD USING THE ABERRATION CORRECTION METHOD, LASER IRRADIATION METHOD USING THE ABERRATION CORRECTION METHOD, ABERRATION CORRECTION DEVICE, AND ABERRATION CORRECTION PROGRAM

ABERRATION CORRECTION METHOD, MICROSCOPE OBSERVATION METHOD USING THE ABERRATION CORRECTION METHOD, LASER IRRADIATION METHOD USING THE ABERRATION CORRECTION METHOD, ABERRATION CORRECTION DEVICE, AND ABERRATION CORRECTION PROGRAM

机译:像差校正方法,使用像差校正方法的显微镜观察方法,使用像差校正方法的激光照射方法,像差校正设备以及像差校正程序

摘要

PROBLEM TO BE SOLVED: To provide an aberration correction method by which a condensation degree of laser light can be enhanced even when a laser irradiation position in a medium is deep.;SOLUTION: The aberration correction method is applied to a laser irradiation device 1 that condenses laser light into a medium 61 having light-transmitting property. The laser irradiation device 1 includes condensing means 50 having an environmental medium 60 having a refractive index larger than that of the medium 61. A depth of a focus of the condensing means 50 from an entrance surface of the medium 61 is defined as d, assuming that a refractive index n of the medium 61 is equal to the refractive index of the environmental medium 60; and a maximum value of longitudinal aberration generated by the medium 61 is defined as Δs. Aberration of the laser light is corrected in such a manner that the condensing point of the laser light is positioned at a distance larger than n×d-Δs and smaller than n×d from the entrance surface of the medium 61, that is, the condensing point is positioned within a range where the longitudinal aberration is present in the medium when the aberration is not corrected.;COPYRIGHT: (C)2015,JPO&INPIT
机译:解决的问题:提供一种像差校正方法,通过该像差校正方法,即使在介质中的激光照射位置较深的情况下,也可以提高激光的凝结度。解决方案:像差校正方法被应用于如下的激光照射装置1:将激光聚集到具有透光性质的介质61中。激光照射装置1包括聚光装置50,该聚光装置50具有折射率比介质61大的环境介质60。聚光装置50从介质61的入射面起的焦点深度设为d。介质61的折射率n等于环境介质60的折射率;介质61产生的纵向像差的最大值定义为Δs。以这样的方式校正激光的像差,使得激光的聚光点位于距介质61的入射表面大于n×d-Δs且小于n×d的距离处,即,聚光点位于不校正像差时介质中存在纵向像差的范围内。;版权所有(C)2015,JPO&INPIT

著录项

  • 公开/公告号JP2015146036A

    专利类型

  • 公开/公告日2015-08-13

    原文格式PDF

  • 申请/专利权人 HAMAMATSU PHOTONICS KK;

    申请/专利号JP20150077881

  • 发明设计人 MATSUMOTO NAOYA;INOUE TAKU;ITO HARUYASU;

    申请日2015-04-06

  • 分类号G02B21/06;

  • 国家 JP

  • 入库时间 2022-08-21 15:35:41

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号