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ELECTRIC HIGH PURITY TIN OR TIN ALLOY PLATING BATH AND PROJECTION ELECTRODE FORMED BY THE PLATING BATH

机译:高纯锡或锡合金电镀浴和由电镀浴形成的投射电极

摘要

PROBLEM TO BE SOLVED: To suppress the generation of voids when a projection electrode is formed with tin or specified tin alloy plating.;SOLUTION: Provided is an electrolytic high purity tin or tin alloy plating bath comprising: (A) the soluble salt of high purity tin with a purity of 99.99% or higher and the soluble salt made of the stannous salt and a mixture of the salt of a metal selected from silver and copper; and (B) a thioalkane type or oxyalkylene type specified aliphatic sulfide compound. Since the specified sulfide compound is added and the stannous salt of high purity tin is used, among β-tins in the tin based film composing a projection electrode, the orientation index of a specified crystal face group such as a {431} face group and a {411} face group is made higher than a prescribed one and the crystal face group is made parallel to the surface of the base, a film having reduced voids can be formed at the crystal grain boundaries of β-tin, and the generation of voids is suppressed, guessingly.;COPYRIGHT: (C)2015,JPO&INPIT
机译:解决的问题:当投影电极由锡或特定的锡合金镀层形成时,为了抑制空隙的产生。;解决方案:提供一种电解高纯锡或锡合金镀浴,其包括:(A)高纯度的可溶性盐纯度为99.99%或更高的锡,以及由亚锡盐和选自银和铜的金属盐的混合物制成的可溶性盐; (B)硫代烷烃型或氧化烯型指定的脂肪族硫化物。由于添加了特定的硫化物化合物并使用了高纯度锡的亚锡盐,因此​​在构成突起电极的锡系膜中的β-锡中,{431}面群,使{411}面组高于规定的面组,并使结晶面组与基底的表面平行,可以在β-锡的晶粒边界处形成具有减少的空隙的膜,并且产生猜想,空隙被抑制了;版权:(C)2015,JPO&INPIT

著录项

  • 公开/公告号JP2015036449A

    专利类型

  • 公开/公告日2015-02-23

    原文格式PDF

  • 申请/专利权人 ISHIHARA CHEMICAL CO LTD;

    申请/专利号JP20130168532

  • 发明设计人 TSUJI SEIKI;NISHIKAWA TETSUJI;

    申请日2013-08-14

  • 分类号C25D3/32;C25D3/60;C25D3/56;C25D7/12;H05K3/34;

  • 国家 JP

  • 入库时间 2022-08-21 15:32:54

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