A method for distinguishing the P -channel or N -channel devices based on different etch rates

摘要

How the devices on CMOS integrated circuits already exist to identify or p-channel device or an n-channel device . The method includes the step of etching the CESL to occur at different rates with respect to two different types of contact etch stop layer (CESL), by which , due to the fact that to investigate the amount of the remaining material unetched I allow for the specific device type .