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Method of manufacturing a low-temperature fired porcelain composition and low-temperature firing porcelain

机译:低温烧制瓷组合物的制造方法和低温烧制瓷

摘要

PROBLEM TO BE SOLVED: To provide a composition for low-temperature firing porcelain which can be fired at a low temperature of 1,100°C or lower and allowing the strength of the porcelain to be further increased, and to provide a method for manufacturing the low-temperature firing porcelain which makes further more mass production possible by permitting a wider firing temperature range.;SOLUTION: The composition for low-temperature firing porcelain includes A component comprising silica and a clay component, and B component comprising feldspar, bone ash and petalite. Therein, a content of the A component is 20 to 80 wt.% and a content of the B component is 80 to 20 wt.%. Further, the method for manufacturing the composition includes: a process of mixing the A component with the B component; a process of grinding the mixed respective components into an average particle size of 11 μm or less; and a firing process of kneading and forming the ground respective components and firing the formed body at a temperature of not lower than 1,030°C and lower than 1,100°C.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种低温烧制用瓷的组合物,其可以在1100℃或更低的低温下烧制,并允许进一步提高瓷的强度,并提供一种制造该烧制用陶瓷的方法。低温烧成瓷,通过允许更宽的烧成温度范围,可实现更大的批量生产。解决方案:低温烧成瓷的组合物包含A成分,该成分包含二氧化硅和粘土成分,B成分包含长石,骨灰和花瓣石。其中,A成分的含量为20〜80重量%,B成分的含量为80〜20重量%。此外,所述组合物的制造方法包括:将A成分与B成分混合的工序;将混合的各组分研磨成平均粒径为11μm或更小的过程;以及将上述各成分捏合形成的烧成工序,以及将成型体在不低于1,030℃且低于1100℃的温度下烧成的方法。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP5661303B2

    专利类型

  • 公开/公告日2015-01-28

    原文格式PDF

  • 申请/专利权人 瀬戸製土株式会社;

    申请/专利号JP20100051634

  • 发明设计人 谷口 良治郎;小林 雄一;

    申请日2010-03-09

  • 分类号C04B33/13;

  • 国家 JP

  • 入库时间 2022-08-21 15:28:03

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