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Maskless exposure apparatus including spatial filter having phase shifter pattern and exposure method
Maskless exposure apparatus including spatial filter having phase shifter pattern and exposure method
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机译:包括具有相移器图案的空间滤波器的无掩模曝光设备和曝光方法
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摘要
The present invention relates to a maskless exposure apparatus and a maskless exposure method which increase resolution of an exposure pattern and enhance efficiency of an optical system by using a phase shifter. More specifically, according to one aspect of the present invention, the maskless exposure apparatus includes: a lighting unit for outputting predetermined light; a spatial light modulator (SLM) for receiving the light from the lighting unit and outputting a light having a predetermined pattern; a beam expander for expanding the light outputted from the spatial light modulator; a micro lens array (MLA) for dividing the light expanded from the beam expander into a plurality of lights and collecting the lights; and a projection lens for adjusting the resolution of the lights collected through the micro lens array and project the adjusted lights into a target, a spatial filter having a phase shifter pattern being positioned between the micro lens array and the projection lens.
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