CLUSTERING BASED CONTINUOUS PERFORMANCE PREDICTION AND MONITORING FOR SEMICONDUCTOR MANUFACTURING PROCESSES USING NONPARAMETRIC BAYESIAN MODELS

摘要

There is provided a method for modeling a semiconductor manufacturing process. The method receives trace data, process variables data and metrology data, obtained during the semiconductor manufacturing process. The method creates, based on the received trace data, the received process variables data and the received metrology data, a performance model of the semiconductor manufacturing process. The created performance model captures nonlinearity characteristics of the semiconductor manufacturing process. The method predicts, based on the created performance model, future values of the received metrology data. The method also detects nonstationarity characteristics of the semiconductor manufacturing process by detecting a significant change in the semiconductor manufacturing process.