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Fast 3D mask model based on implicit countors
Fast 3D mask model based on implicit countors
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机译:基于隐式轮廓的快速3D蒙版模型
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摘要
Computer-readable medium and methods for photolithographic simulation of scattering. A design layout comprising a layout polygon is received. A skeleton representation of a mask shape that is created responsive to e-beam writing of the layout polygon is generated. The skeleton representation is defined by a plurality of skeleton points. Individual scattering patterns for the skeleton points are selected from a lookup table of pre-determined scattering patterns. Each of the individual scattering patterns representing an amount of optical scattering for a corresponding one of the skeleton points. A simulated wafer image is produced responsive to the individual scattering patterns.
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