Device for oblique Angle deposition of materials at NaNo scale and Microscale using PVD techniques

摘要

The present patent application relates to a device to control the angle of Growth contributing Evaporated on a material surface of a substrate without the use of a machine that works from Servo Motors.With the aim of Deposit materials in Thin Film form a certain oblique angle in the process of recubrimientode surfaces such as PVD (Vapour Deposition, in English vaporphase Deposition).The device comprises the following: a componentesestructurales Tube Diameter, two vertical shafts, a horizontal Shaft, a Transmission gear is a Gear Driven Gear driver degeometru00eda Special, a special geometry, two portasubstrato Ssuperior and Bottom Rod, a Clamping plate and a Clamping or desubjugation.