首页> 外国专利> COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID

COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID

机译:用于形成低介电常数非晶态二氧化硅涂层膜和由这种涂覆液获得的低介电常数非晶态二氧化硅涂层膜的涂布液

摘要

A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA) and alcoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA), alcoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).
机译:用于形成介电常数为3.0以下且膜强度(杨氏模量)为3.0GPa以上的低介电常数的非晶质二氧化硅系涂膜的涂布液,且表面平滑且疏水性优异。涂布液包含(1)在四烷基氢氧化铵(TAAOH)存在下通过水解双(三烷氧基甲硅烷基)烷烃(BTASA)和烷氧基硅烷(AS)获得的硅化合物,或(2)通过水解双(三烷氧基甲硅烷基)烷烃获得的硅化合物。 (BTASA),烷氧基硅烷(AS)和原硅酸四烷基酯(TAOS)在四烷基氢氧化铵(TAAOH)的存在下。

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