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SPATIALLY SELECTIVE LASER ANNEALING APPLICATIONS IN HIGH-EFFICIENCY SOLAR CELLS

机译:空间选择性激光退火在高效太阳能电池中的应用

摘要

Discloses various laser processing methods for generating various types of heterojunction emitter and homojunction emitter solar cells. Methods include base and emitter contact openings, selective doping, metal ablation, annealing to improve passivation, and selective emitter doping through laser heating of aluminum. Also disclosed are laser processing methods suitable for selective amorphous silicon ablation and selective doping for heterojunction solar cells. Disclose laser ablation techniques that leave the underlying silicon in a substantially intact state. These laser processing techniques include crystalline silicon substrates, which are planar or textured / three dimensional, and can also be fabricated through wire subwaffer processes or through epitaxial deposition processes or through other RTI ID = 0.0 The present invention can be applied to a semiconductor substrate that further includes a crystalline silicon substrate. These techniques are well suited for crystalline semiconductors including crystalline silicon thin films.
机译:公开了用于产生各种类型的异质结发射极和同质结发射极太阳能电池的各种激光处理方法。方法包括基极和发射极接触开口,选择性掺杂,金属烧蚀,退火以改善钝化,以及通过对铝进行激光加热来进行选择性发射极掺杂。还公开了适合于异质结太阳能电池的选择性非晶硅烧蚀和选择性掺杂的激光加工方法。披露激光烧蚀技术,使下层硅保持基本完整的状态。这些激光加工技术包括平面的或纹理化的/三维的晶体硅衬底,并且还可以通过导线亚衬工艺或通过外延沉积工艺或通过其他方式来制造。本发明可以应用于半导体衬底还包括晶体硅衬底。这些技术非常适合于包括晶体硅薄膜的晶体半导体。

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