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How to Update the chemical solution used in the etching device for a liquid crystal glass, a chemical solution for updating nozzle and update for the chemical solution

机译:如何更新液晶玻璃蚀刻设备中使用的化学溶液,更新喷嘴的化学溶液和化学溶液的更新

摘要

In order to perform etching of the liquid crystal glass while maintaining an optimum environment, updating of the chemical liquid used for the etching apparatus of the liquid crystal glass is promoted, thereby to obtain a high quality liquid crystal glass part. Regarding the method for updating the chemical solution used for the liquid crystal glass etching apparatus, a nozzle for discharging the chemical liquid and a nozzle for suction are arranged in an etching liquid tank filled with the chemical liquid, and in a state where the nozzle is immersed in the chemical liquid, discharge of the chemical liquid , Suction is performed, discharge and suction using the above-described nozzle are performed at the same time, and updating of the chemical liquid is promoted by applying uniform stress to the chemical liquid.Selection Chart Figure 4
机译:为了在维持最佳环境的同时进行液晶玻璃的蚀刻,促进用于液晶玻璃的蚀刻装置的药液的更新,从而得到高品质的液晶玻璃部件。关于用于液晶玻璃蚀刻装置的药液的更新方法,在填充有药液的蚀刻液槽内配置有用于排出药液的喷嘴和用于吸引的喷嘴。浸入药液中,进行药液排出,进行抽吸,同时使用上述喷嘴进行排出和抽吸,并通过对药液施加均匀的应力来促进药液的更新。图表图4

著录项

  • 公开/公告号JP5986223B2

    专利类型

  • 公开/公告日2016-09-06

    原文格式PDF

  • 申请/专利权人 株式会社トーア電子;

    申请/专利号JP20140551770

  • 发明设计人 木内 丈司;

    申请日2012-12-11

  • 分类号C03C15/00;

  • 国家 JP

  • 入库时间 2022-08-21 14:42:10

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