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Wide-gap semiconductor band gap electronic properties measurement method and wide gap semiconductor band gap electronic properties measuring device

机译:宽禁带半导体带隙电子性能测量方法和宽禁带半导体带隙电子性能测量装置

摘要

PROBLEM TO BE SOLVED: To provide a measuring method and a measuring apparatus for band gap electronic physical properties of a wide gap semiconductor, in which accurate measurement can be performed and electrodes can be removed easily after evaluation.;SOLUTION: An evaluation device comprises: a mercury probe 20 forming a first electrode 20a which is in contact with a surface of a wide gap semiconductor and acts as a Schottky electrode, and a second electrode 20b which acts as a pseudo ohmic electrode; a voltage pulse generation section; an impedance measuring section; a monochromatic light irradiation section and a control section, and detects/analyzes defect level information remaining in the wide gap semiconductor by utilizing a transient response of photo-capacitance with light excitation from a defect level caused by monochromatic spectral irradiation to the wide gap semiconductor. By using the mercury probe 20, it is not necessary to form electrodes in the wide gap semiconductor beforehand and further, because of a non-invasive manner, an original state can be recovered easily after measuring band gap electronic physical properties.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种用于宽间隙半导体的带隙电子物理性质的测量方法和测量装置,其中可以进行精确的测量,并且在评估后可以容易地去除电极。汞探针20形成第一电极20a,该第二电极与宽间隙半导体的表面接触并用作肖特基电极;以及第二电极20b,其用作伪欧姆电极。电压脉冲产生部分;阻抗测量部分;单色光照射部分和控制部分,并利用来自由单色光谱照射引起的缺陷能级对宽间隙半导体的光激发的光电容的瞬态响应,利用光电容的瞬态响应来检测/分析宽间隙半导体中残留的缺陷能级信息。通过使用水银探针20,不需要预先在宽间隙半导体中形成电极,并且由于无创方式,在测量带隙电子物理性质之后可以容易地恢复原始状态。 C)2014,日本特许厅&INPIT

著录项

  • 公开/公告号JP6023497B2

    专利类型

  • 公开/公告日2016-11-09

    原文格式PDF

  • 申请/专利权人 学校法人中部大学;

    申请/专利号JP20120168032

  • 发明设计人 中野 由崇;中村 圭二;

    申请日2012-07-30

  • 分类号H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 14:41:08

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