Semiconductor processing process, in particular recycling method and apparatus for recycling waste water containing slurry from the chemical mechanical polishing process

摘要

It regards the recycling manner and the device of the liquid-waste which contains slurry from semiconductor treatment process and especially chemical machine grinding process. As for aforementioned manner, includes new slurry the liquid-waste which is introduced the wraparound tank (10) continually, at that time, the wraparound tank (10) from the mixed liquid-waste is extracted continually, the liquid-waste passes and the ultrafiltration device (20) it is induced, fetching the fluid by it is concentrated and the concentrated liquid-waste it forms, the concentrated liquid-waste is introduced, the wraparound tank (10) the wraparound tank (10) contents ones it is mixed and you can obtain the mixed liquid-waste percolation step and the mixed liquid-waste where are extracted the wraparound tank (10) from continually, is fetched the mixed liquid-waste which the ultrafiltration device (20) It is introduced, it is concentrated by fetching the fluid and forms the concentrated liquid-waste, when the concentrated liquid-waste the wraparound tank (10) being introduced, the wraparound tank (10) to it can obstruct the addition of the new liquid-waste or concentrated step after the percolation step which is cut off substantially and it consists of. Choice figure Drawing 2