首页>
外国专利>
Reduction type electroless silver plating solution and reduction type electroless silver plating method
Reduction type electroless silver plating solution and reduction type electroless silver plating method
展开▼
机译:还原型化学镀银溶液和还原型化学镀银方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide: a reducing electroless silver plating solution that can form a plated film having favorable film characteristics and a favorable appearance by preventing decomposition of the silver to maintain the stability of the silver in the plating solution and by preventing an underlying metal or the like from becoming excessively roughened; and a reducing electroless silver plating method using the silver plating solution.;SOLUTION: The reducing electroless silver plating solution contains an aqueous silver salt and a reducing agent, and contains cyanide ions at 0.006×10-3 to 12.5×10-3 mol/L.;COPYRIGHT: (C)2013,JPO&INPIT
展开▼
机译:解决的问题:提供一种还原性化学镀银溶液,该溶液可通过防止银的分解以保持镀液中的银的稳定性并防止形成底层而形成具有良好膜特性和良好外观的镀膜。金属等变得过于粗糙;解决方案:该还原性化学镀银溶液包含一种银盐水溶液和一种还原剂,并含有0.006×10 -3 Sup>至12.5×10 -3 Sup> mol / L .;版权:(C)2013,日本特许厅
展开▼