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Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
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机译:光刻显影液,形成抗蚀剂图案的方法以及生产光刻显影液的方法和设备
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摘要
A developing solution for photolithography in which tetrabutylammonium hydroxide (TBAH) is used as an alkaline agent of the developing solution and deposition of TBAH is suppressed. A method for producing a developing solution for photolithography capable of suppressing TBAH deposition when producing the developing solution by diluting a concentrated developing solution containing TBAH and a production apparatus used for the production method. The developing solution includes tetrabutylammonium hydroxide and at least one of a water-soluble organic solvent, a surfactant, and a clathrate compound. The temperature of the liquid is maintained at 27° C. or higher during dilution.
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