System and method for selecting a derating factor to balance use of components having disparate electrical characteristics

摘要

A test system and method for selecting a derating factor to be applied to a ratio of transistors having disparate electrical characteristics in a wafer fabrication process. In one embodiment, the test system includes: (1) structural at-speed automated test equipment (ATE) operable to iterate structural at-speed tests at multiple clock frequencies over integrated circuit (IC) samples fabricated under different process conditions and (2) derating factor selection circuitry coupled to the structural at-speed ATE and configured to employ results of the structural at-speed tests to identify performance deterioration in the samples, the performance deterioration indicating the derating factor to be employed in a subsequent wafer fabrication process.