首页> 外国专利> Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor

Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor

机译：光刻设备，其配置为重建航迹并将比较后的航迹与图像传感器检测到的航迹进行比较

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摘要

The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.

机译：本发明涉及一种用于检测包括在用于曝光衬底的光刻设备中的辐射束的横截面中的辐射强度的空间差异的空间图案的图像。该图像传感器包括：透镜（ 5 ），其被布置为形成空中图案的检测图像;以及图像检测器（ 6 ），其被布置为测量多个辐射强度，其中，在检测图像中的位置。 展开▼

著录项

公开/公告号US9329500B2

专利类型

公开/公告日2016-05-03

原文格式PDF

申请/专利权人 FRANK STAALS;JOERI LOF;ERIK ROELOF LOOPSTRA;WIM TJIBBO TEL;BEARRACH MOEST;
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申请/专利号US20080598377

发明设计人 WIM TJIBBO TEL;BEARRACH MOEST;FRANK STAALS;ERIK ROELOF LOOPSTRA;JOERI LOF;
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申请日2008-04-29

分类号G03F7/09;G03F7/20;G03F9/00;

国家 US

入库时间 2022-08-21 14:29:30

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机译：图案检查装置，图案位置测量装置，航空图像测量系统，用于测量航空图像的方法，图案位置修复装置，用于修复图案位置的方法，航空图像数据处理装置，用于处理航空图像数据的方法，图案曝光装置，用于曝光图案，制造掩模的方法以及掩模制造系统

4. PATTERN INSPECTION APPARATUS PATTERN POSITION MEASUREMENT APPARATUS AERIAL IMAGE MEASUREMENT SYSTEM METHOD FOR MEASURING AERIAL IMAGE PATTERN POSITION REPAIRING APPARATUS METHOD FOR REPAIRING PATTERN POSITION AERIAL IMAGE DATA PROCESSING APPARATUS METHOD FOR PROCESSING AERIAL IMAGE DATA PATTERN EXPOSURE APPARATUS METHOD FOR EXPOSING PATTERN METHOD FOR MANUFACTURING MASK AND MASK MANUFACTURING SYSTEM [P] . 韩国专利： KR102068649B1 . 2020-01-21

机译：图案检查设备图案位置测量设备航空图像测量系统方法，用于测量航空图像图案位置修复设备，方法，用于修补图案位置，航空图像数据，处理设备，方法，用于处理，方法，方法，过程，方法，处理系统

5. PATTERN INSPECTION APPARATUS, PATTERN POSITION MEASUREMENT APPARATUS, AERIAL IMAGE MEASUREMENT SYSTEM, METHOD FOR MEASURING AERIAL IMAGE,PATTERN POSITION REPAIRING APPARATUS, METHOD FOR REPAIRING PATTERN POSITION, AERIAL IMAGE DATA PROCESSING APPARATUS, METHOD FOR PROCESSING AERIAL IMAGE DATA, PATTERN EXPOSURE APPARATUS, METHOD FOR EXPOSING PATTERN, METHOD FOR MANUFACTURING MASK, AND MASK MANUFACTURING SYSTEM [P] . 美国专利： US2018293720A1 . 2018-10-11

机译：模式检查装置，模式位置测量装置，航空图像测量系统，航空图像的测量方法，模式位置修复装置，模式位置修复方法，航空图像数据处理装置，处理方法，处理方法曝光图案，制造面具的方法以及面具制造系统

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