首页> 外国专利> Vacuum arc source of voltaic arc, as well as a vacuum evaporation chamber of voltaic arc with a vacuum evaporation source of arc

Vacuum arc source of voltaic arc, as well as a vacuum evaporation chamber of voltaic arc with a vacuum evaporation source of arc

机译:弧形真空电弧源,以及弧形真空蒸发源的弧形真空蒸发室

摘要

Vacuum source of arc vacuum, comprising a ring-shaped magnetic field source (2) and a cathode body (3) with an evaporation material (31) as a cathode (32) for the generation of a discharge of arc on an evaporation surface (33) of the cathode (32), in which the cathode body (3) is limited in a first axial direction by a cathode bottom (34) and in a second axial direction by the evaporation surface (33) in axial direction, and the ring-shaped magnetic field source (2) is polarized parallel or antiparallel to a normal surface (300) of the evaporation surface (33) and is concentrically arranged to normal surface (300) of the evaporation surface (33), in which a magnetic field amplification ring (4) is disposed on a side away from the evaporation surface at a second predetermined distance (A2) in front of the cathode bottom ( 34), characterized in that an inner diameter (DI) of the magnetic field amplification ring (4) is about 3%, in particular up to 10%, preferably up to 15%, especially up to 50% of a cathode diameter (32) and the magnetic field amplification ring comprises a plurality of permanent magnets aligned essentially parallel to the normal surface.
机译:电弧真空的真空源,包括环形磁场源(2)和带有蒸发材料(31)作为阴极(32)的阴极体(3),用于在蒸发表面上产生电弧放电(阴极(32)的33),其中阴极体(3)在第一轴向上由阴极底部(34)限制,在第二轴向上由蒸发表面(33)在轴向方向上限制,并且环形磁场源(2)平行于或反向平行于蒸发表面(33)的法向表面(300)极化,并且同心地布置在蒸发表面(33)的法向表面(300)上。磁场放大环(4)在阴极底部(34)的前方以第二预定距离(A2)设置在远离蒸发表面的一侧,其特征在于,磁场放大环(DI)的内径(DI) 4)约为3%,特别是最高10%,优选最高15%,尤其是u阴极直径(p)为阴极直径(32)的50%至50%,并且磁场放大环包括基本上平行于法向表面排列的多个永磁体。

著录项

  • 公开/公告号ES2575119T3

    专利类型

  • 公开/公告日2016-06-24

    原文格式PDF

  • 申请/专利权人 OERLIKON SURFACE SOLUTIONS AG PFÄFFIKON;

    申请/专利号ES20080717591T

  • 发明设计人 VETTER JÖRG;

    申请日2008-03-11

  • 分类号H01J37/32;H01J37/305;

  • 国家 ES

  • 入库时间 2022-08-21 14:22:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号