ORGANIC TREATMENT SOLUTION FOR PATTERNING OF RESIST FILM, METHOD FOR PRODUCING ORGANIC TREATMENT SOLUTION FOR PATTERNING OF RESIST FILM, STORAGE CONTAINER FOR ORGANIC TREATMENT SOLUTION FOR PATTERNING OF RESIST FILM, AND PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING SAME

摘要

Provided are: an organic treatment solution for patterning resist films, containing concentrations of metal elements Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn not exceeding 3ppm, said organic treatment solution for patterning resist films being capable of reducing the occurrence of particles in negative pattern formation of fine patterns (30nm node or less, for example) using an organic treatment solution for patterning of resist film, particularly using an organic developer; a method for producing an organic treatment solution for patterning of resist film; a storage container for organic treatment solution for patterning of resist film; and pattern formation method and electronic device production method using same.