首页> 外国专利> METHOD AND APPARATUS FOR TEACHING DELIVERY LOCATION AND APPARATUS FOR PROCESSING SUBSTRATE

METHOD AND APPARATUS FOR TEACHING DELIVERY LOCATION AND APPARATUS FOR PROCESSING SUBSTRATE

机译:授课地点的教学方法和装置以及处理基质的装置

摘要

(challenge) provides also possible to accurately teaches a position also the substrate for the hand of a conventional substrate processing apparatus position teaching method, also position teaching device and a substrate processing apparatus. And (solving means) may position teaching apparatus, it has the same shape as the substrate such as a semiconductor wafer to be processed by the apparatus, provided with the teachings substrate 100 for the conductive coating made on its surface. The teaching device is also located, the base line (21) is formed on an upper surface thereof, has a base member 20 consisting of an insulating coating on its surface. The base member 20 is formed on, respectively, the entrance to the contact member having the shape of a pillar shape extending in the vertical direction (31), the inlet contact member 32, contact members for the Y-direction (41), the contact for the Y-direction member 42, an upright X-direction the contact members (51) are provided. ;
机译:(挑战)还提供了可能准确地教导位置的方法,该方法还包括用于传统基板处理设备的手的基板的位置教导方法,位置教导装置和基板处理设备。并且(解决手段)可以将示教装置定位,其形状与要由该装置处理的诸如半导体晶片的基板相同,并且在其表面上设有用于导电涂层的示教基板100。示教装置也位于,基线(21)形成在其上表面上,具有在其表面上由绝缘涂层组成的基础构件20。基座部件20分别形成在沿上下方向延伸的柱状的接触部件的入口(31),入口接触部件32,Y方向的接触部件(41),另外,在Y方向的部件42上设置有抵接部51,在X方向的直立方向上设置有抵接部件51。 ;

著录项

  • 公开/公告号KR101588938B1

    专利类型

  • 公开/公告日2016-01-26

    原文格式PDF

  • 申请/专利权人 가부시키가이샤 스크린 홀딩스;

    申请/专利号KR20130167147

  • 发明设计人 요시다 다케시;

    申请日2013-12-30

  • 分类号H01L21/677;B25J13/08;B25J9/16;

  • 国家 KR

  • 入库时间 2022-08-21 14:13:03

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