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A method of fabricating a substrate patterned with nanowires, fabricated substrate, and using the substrate
A method of fabricating a substrate patterned with nanowires, fabricated substrate, and using the substrate
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机译:一种制造用纳米线图案化的基板的方法,所制造的基板以及使用该基板的方法
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摘要
According to the present invention, there is provided a method of making a nanowire patterned substrate characterized in that no lubricant and no lithographic resist mask is used in the method and only by moving a donor substrate with nanowires relative to a substrate and locally different tribological properties on the substrate Surface of the substrate is selectively deposited at locally defined locations of the substrate a certain number of nanowires. In addition, a substrate is provided which can be produced by the method according to the invention and contains a specific number of nanowires selectively on a surface at locally defined locations. Furthermore, the use of the substrate according to the invention in microelectronics, microsystem technology and / or microsensorics is proposed.
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