PLASMA PROCESSING DEVICE AND PRECOAT METHOD, AND METHOD FOR PRECOAT PROCESS

摘要

PROBLEM TO BE SOLVED: To suppress the pollution on a workpiece owing to wear of a partitioning plate.SOLUTION: A plasma processing device 10 comprises: a partitioning plate 40; an antenna 20; and a radio frequency power source 72. The partitioning plate 40 has a plurality of openings 40h of which the maximum width is twice or less the length of a sheath corresponding plasma of a gas for plasma excitation. The partitioning plate partitions the inside of a process chamber 11 into a plasma generation chamber S1 and a process chamber S2. The antenna 20 generates plasma of plasma excitation gas supplied to the plasma generation chamber S1. The radio frequency power source 72 generates plasma of a precoat gas supplied to the plasma generation chamber S1, caused to flow into the process chamber S2 through the plurality of openings 40h of the partitioning plate 40. The plasma processing device 10 performs a precoat process on a face of the partitioning plate 40 on a side of the process chamber S2 by causing the radio frequency power source 72 to generate plasma of a precoat gas before performing a plasma process by plasma of plasma excitation gas.SELECTED DRAWING: Figure 1