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Interlayer filler composition for three-dimensional stacked semiconductor device, the three-dimensional stacked semiconductor device, and manufacturing method of a three-dimensional stacked semiconductor device

机译:用于三维堆叠半导体器件的层间填料组合物,三维堆叠半导体器件以及三维堆叠半导体器件的制造方法

摘要

PROBLEM TO BE SOLVED: To provide an interlaminar filler composition for a three-dimensional laminate type semiconductor device excellent in thermal conductivity, adjustable to 3D laminate process, capable of securing a bonding between semiconductor device chips, and capable of forming an interlaminar filled layer maintaining stable bonding even under several environmental changes, to provide the three-dimensional laminate type semiconductor device, and to provide a manufacturing method of the semiconductor device.SOLUTION: An interlaminar filler composition for a three-dimensional laminate type semiconductor device contains: a resin having a melt viscosity at 120°C of 0.001 to 1 Pa s; and an inorganic filler having a volume average particle diameter of 0.1 μm to 10 μm, a specific surface area of 1 m2/g to 60 m2/g and a heat conductivity of 2 W/(m K) or more.
机译:解决的问题:提供一种用于导热性优异,可调节至3D层压工艺,能够确保半导体器件芯片之间的键合并能够形成层间填充层的三维层压型半导体器件的层间填充剂组合物即使在几个环境变化下也能保持稳定的键合,以提供三维层压型半导体器件,并提供该半导体器件的制造方法。解决方案:一种用于三维层压型半导体器件的层间填充剂组合物包含: 120℃下的熔融粘度为0.001〜1Pa·s。无机填料的体均粒径为0.1μm至10μm,比表面积为1m2 / g至60m2 / g,并且热导率为2W /(m·K)以上。

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