Organic processing liquid for patterning resist film, method for producing organic processing liquid for patterning resist film, container for organic processing liquid for patterning resist film, pattern formation method using these, and Manufacturing method of electronic device

摘要

An organic processing liquid for patterning a resist film, wherein the metal element concentrations of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn are all 3 ppm or less. Resist film capable of reducing the generation of particles in a negative pattern forming method of forming a fine pattern (for example, 30 nm node or less) using an organic processing solution for patterning a resist film, particularly using an organic developer. Patterning organic processing liquid, resist film patterning organic processing liquid manufacturing method, resist film patterning organic processing liquid container, pattern formation method using these, and electronic device Can be provided.