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Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method

机译:无掩模曝光装置,无掩模曝光方法以及由该无掩模曝光装置和无掩模曝光方法制造的显示基板

摘要

A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
机译:无掩模曝光装置包括:曝光头,其包括数字微镜装置;该数字微镜装置被配置为通过反射来自曝光源的源光束,将曝光束扫描到基板。系统控制部分,被配置为通过利用图形数据系统文件来控制数字微镜设备。图形数据系统文件在平面图中包括用于源电极,漏电极以及在源电极和漏电极之间的沟道部分的数据。通道部分包括在垂直于曝光头的扫描方向的方向上延伸的第一部分。通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。

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