首页> 外国专利> SUBSTRATE ALIGNING METHOD SUBSTRATE RECEIVING METHOD SUBSTRATE LIQUID PROCESSING METHOD SUBSTRATE ALIGNING APPARATUS SUBSTRATE RECEIVING APPARATUS SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE ALIGNING METHOD SUBSTRATE RECEIVING METHOD SUBSTRATE LIQUID PROCESSING METHOD SUBSTRATE ALIGNING APPARATUS SUBSTRATE RECEIVING APPARATUS SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

机译:基质标记方法基质接收方法基质液体处理方法基质标记设备基质接收设备基质液体处理设备和基质处理系统

摘要

To prevent contact between the substrate and the substrate support or the substrate even if the substrate is warped (deformed). In the present invention, the substrate support 39 is moved from a position different from the positions A and C and the bent-down positions B and D which are partially bent along the outer peripheral edge of the substrate 8 toward the central portion of the substrate 8, . The present invention can be applied to a substrate sorting method (substrate sorting apparatus) for aligning one or more substrates 8 or a substrate receiving method (substrate receiving apparatus) for receiving the substrate 8 with the substrate support 39, (Substrate liquid processing apparatus) for collectively processing a plurality of substrates 8, and a substrate processing system 1 having these substrate aligning apparatuses, substrate receiving apparatuses, and substrate liquid processing apparatuses .
机译:为了防止衬底与衬底支撑件或衬底之间的接触,即使衬底发生了翘曲(变形)。在本发明中,基板支撑件39从与沿基板8的外周边缘部分地弯曲的位置A和C以及向下弯曲的位置B和D不同的位置朝向基板的中央部分移动。 8 、。本发明可以应用于用于对准一个或多个基板8的基板分选方法(基板分选设备),或用于将基板8与基板支撑件39一起接收的基板接收方法(基板接收设备),(基板液体处理设备)用于集中处理多个基板8的基板和具有这些基板对准装置,基板接收装置和基板液体处理装置的基板处理系统1。

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