Rotation type of by-product trapping apparatus in order to protect the vacuum pump

摘要

The present invention relates to a rotary by-product trapping apparatus to protect a vacuum pump, installed to prevent semiconductor (reaction) by-products generated in a processor chamber for deposition and etching processes used during a semiconductor manufacturing process from being sucked by a vacuum pump. According to the present invention, in a by-product trapping apparatus installed between a processor chamber and a vacuum pump to prevent by-products generated in the processor chamber from being sucked by the vacuum pump, the by-product trapping apparatus comprises: a trapping body including a rotation generating air inlet rotating air supplied by suction force of the vacuum pump to trap first by-products; a by-product trapping cone member which includes multiple trapping cones having, in an upper part, a rotation generating air inlet rotating again the supplied air to trap second by-products; and a trapping cone member cover having multiple trapping holes moving again the supplied air to an upper side to trap third by-products. Thus, since the supplied air is rotated and moved to the upper side due to suction force of the vacuum pump, the by-products included in the air are trapped.