METHODS FOR CONSTRUCTING AN OPTIMAL ENDPOINT ALGORITHM

摘要

A method is provided for automatically identifying an optimal endpoint algorithm to qualify a process endpoint during substrate processing in a plasma processing system. The method includes receiving data from a plurality of sensors while processing at least one substrate within a plasma processing system, wherein the sensor data includes a plurality of signal streams from a plurality of sensor channels. The method also includes identifying an end point domain, wherein the end point domain is an approximation period in which process end point occurrences are expected.;